首页> 外文OA文献 >Modeling of micro- and nano-scale domain recording by high-voltage atomic force microscopy in ferroelectrics-semiconductors
【2h】

Modeling of micro- and nano-scale domain recording by high-voltage atomic force microscopy in ferroelectrics-semiconductors

机译:通过高压对微米和纳米级域记录进行建模   铁电半导体中的原子力显微镜

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The equilibrium sizes of micro- and nano-domains caused by electric field ofatomic force microscope tip in ferroelectric semiconductor crystals have beencalculated. The domain was considered as a prolate semi-ellipsoid with ratherthin domain walls. For the first time we modified the Landauer model allowingfor semiconductor properties of the sample and the surface energy of the domainbutt. The free carriers inside the crystal lead to the formation of thescreening layer around the domain, which partially shields its interior fromthe depolarization field. We expressed the radius and length of the domainthough the crystal material parameters (screening radius, spontaneouspolarization value, dielectric permittivity tensor) and atomic force microscopetip characteristics (charge, radius of curvature). The obtained dependence ofdomain radius via applied voltage is in a good quantitative agreement with theones of submicron ferroelectric domains recorded by high-voltage atomic forceand scanning probe microscopy in LiNbO3 and LiTaO3 crystals.
机译:计算了铁电半导体晶体中原子力显微镜尖端电场引起的微域和纳米域的平衡尺寸。该结构域被认为是具有相当薄的结构域壁的扁长半椭圆体。我们首次修改了Landauer模型,考虑了样品的半导体特性和畴对接的表面能。晶体内部的自由载流子导致在畴周围形成屏蔽层,从而部分屏蔽了其内部免受去极化场的影响。我们通过晶体材料参数(屏蔽半径,自发极化值,介电常数张量)和原子力显微镜尖端特性(电荷,曲率半径)表示了区域的半径和长度。通过施加电压获得的畴半径的依赖性与在LiNbO3和LiTaO3晶体中通过高压原子力和扫描探针显微镜记录的亚微米铁电畴的良好定量一致性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号